- ionization by sputtering
- Макаров: ионизация при распылении
Универсальный англо-русский словарь. Академик.ру. 2011.
ionization by sputtering
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Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… … Wikipedia
radiation — radiational, adj. /ray dee ay sheuhn/, n. 1. Physics. a. the process in which energy is emitted as particles or waves. b. the complete process in which energy is emitted by one body, transmitted through an intervening medium or space, and… … Universalium
spectroscopy — spectroscopist /spek tros keuh pist/, n. /spek tros keuh pee, spek treuh skoh pee/, n. the science that deals with the use of the spectroscope and with spectrum analysis. [1865 70; SPECTRO + SCOPY] * * * Branch of analysis devoted to identifying… … Universalium
surface analysis — ▪ chemistry Introduction in analytical chemistry (chemistry), the study of that part of a solid that is in contact with a gas or a vacuum. When two phases of matter are in contact, they form an interface. The term surface is usually… … Universalium
Gas-filled tube — See also: Gas discharge lamp A gas filled tube, also known as a discharge tube, is an arrangement of electrodes in a gas within an insulating, temperature resistant envelope. Although the envelope is typically glass, power tubes often use… … Wikipedia
Auger electron spectroscopy — (AES; Auger pronounced|oːʒeː in French) is a common analytical technique used specifically in the study of surfaces and, more generally, in the area of materials science. Underlying the spectroscopic technique is the Auger effect, as it has come… … Wikipedia
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vacuum technology — Introduction all processes and physical measurements carried out under conditions of below normal atmospheric pressure. A process or physical measurement is generally performed in a vacuum for one of the following reasons: (1) to remove the … Universalium
Plasma-enhanced chemical vapor deposition — PECVD machine at LAAS technological facility in Toulouse, France. Plasma enhanced chemical vapor deposition (PECVD) is a process used to deposit thin films from a gas state (vapor) to a solid state on a substrate. Chemical reactions are involved… … Wikipedia
Thin-film deposition — is any technique for depositing a thin film of material onto a substrate or onto previously deposited layers. Thin is a relative term, but most deposition techniques allow layer thickness to be controlled within a few tens of nanometers, and some … Wikipedia
Thin film — A thin film is a layer of material ranging from fractions of a nanometer (monolayer) to several micrometers in thickness. Electronic semiconductor devices and optical coatings are the main applications benefiting from thin film construction. A… … Wikipedia
